Research Article
Open access
Published on 7 November 2023
Download pdf
Shu,T. (2023). Reliability issues of GaN HEMT: Current status and challenges. Applied and Computational Engineering,23,238-244.
Export citation

Reliability issues of GaN HEMT: Current status and challenges

Tianwei Shu *,1,
  • 1 University of Science and Technology of China

* Author to whom correspondence should be addressed.

https://doi.org/10.54254/2755-2721/23/20230661

Abstract

With the development of power electronic devices, there is an increasing demand for energy-saving, emission reduction, and environmental protection. Thus, higher energy conversion efficiency of power electronic devices is required. While traditional Si-based power electronic devices have the disadvantage of low energy utilization efficiency and high thermal losses, GaN-based HEMT has significant advantages, making it a frontier and hotspot in global semiconductor research. However, the failure mechanisms that affect the reliability of GaN HEMTs are not completely comprehended. Many reliability issues affect devices’ performance, among which electrical reliability and thermal reliability are widely studied concerns. Electrical reliability issues contain inverse piezoelectric effect, hot electron effect, trapping effect, and mental instability. Thermal reliability issues contain self-heating effects, which are caused by the material’s unsatisfying thermal conductivity, and improper structure design. This paper is focused on the current research results of the GaN HEMT’s electrical reliability and thermal reliability. The first part of this paper gives a review of GaN HEMT reliability issues at their current status, and the second part outlines the challenges of GaN HEMTs in future development. This review will help researchers to better understand factors that affect GaN HEMT’s reliability and help with their device design for further research.

Keywords

gallium nitride, HEMTs, reliability, challenge

[1]. Yao Z W, Zhu H, Li Y L and Xie N 2023 Investigation of trap characteristics under the inverse piezoelectric effect in AlGaN/GaN HEMT devices at room temperature and low temperature Semiconductor Science and Technology 38 5.

[2]. F. Donmezer 2013 Multiscale electro-thermal modeling of AlGaN/GaN heterostructure field effect transistors Engineering.

[3]. Khan M A, Shur M S, Chen Q C and Kuznia J N 1994 Current/voltage characteristic collapse in AlGaN/GaN heterostructure insulated gate field effect transistors at high drain bias Electronics Letters 30 2175.

[4]. Klein P B, Freitas Jr J A, Binari S C and Wickenden A E 1999 The impact of surface states on the DC and RF characteristics of AlGaN/GaN HFETs IEEE Transactions on Electron Devices 75 4016.

[5]. Vetury R, Zhang N Q, Keller S and Mishra U K 2001 Observation of deep traps responsible for current collapse in GaN metal–semiconductor field-effect transistors Applied Physics Letters 48 560.

[6]. Mizutani T, Ohno Y, Akita M, Kishimoto S and Maezawa K 2003 A Study on Current Collapse in AlGaN/GaN HEMTs Induced by Bias Stress Applied Physics Letters 50 2015.

[7]. Faqir M, Bouya M, Malbert N, Labat N, Carisetti D, Lambert B, Verzellesi G and Fantini F 2010 Analysis of current collapse effect in AlGaN/GaN HEMT: Experiments and numerical simulations Microelectronics Reliability 50 1520.

[8]. Saptarsi Ghosh, Subhashis Das, Syed Mukulika Dinara, Ankush Bag and Apurba Chakraborty 2018 OFF-State Leakage and Current Collapse in AlGaN/GaN HEMTs: A Virtual Gate Induced by Dislocations IEEE Transactions on Electron Devices 65 1333.

[9]. Pichingla Kharei, Achinta Baidya, Niladri Pratap Maity and Reshmi Maity 2023 An insight to current collapse in GaN HEMT and suppressing techniques Engineering Research Express 5.

[10]. Enrico Zanoni, Fabiana Rampazzo, Carlo De Santi, Gao Z, Chandan Sharma, Nicola Modolo, Giovanni Verzellesi, Alessandro Chini, Gaudenzio Meneghesso and Matteo Meneghini 2022 Failure Physics and Reliability of GaN-Based HEMTs for Microwave and Millimeter-Wave Applications: A Review of Consolidated Data and Recent Results Applications and Material Science 219.

[11]. Gao F, Swee Ching Tan, Jesús A. del Alamo, Carl V. Thompson and Tomás Palacios 2013 Impact of Water-Assisted Electrochemical Reactions on the OFF-State Degradation of AlGaN/GaN HEMTs IEEE Transactions on Electron Devices 61 437.

[12]. Whiting P G, Holzworth M R, Lind A G, Pearton S J, Jones K S, Liu L, Kang T S, Ren F and Xin Y 2017 Erosion defect formation in Ni-gate AlGaN/GaN high electron mobility transistors Microelectronics Reliability 70 32.

[13]. Kaushik Mazumdar, Sanam Kala and Aniruddha Ghosal 2019 Nanocrack formation due to inverse piezoelectric effect in AlGaN/GaN HEMT Superlattices and Microstructures 125 120.

[14]. Zhu Q, Ma X H, Hou B, Wu M, Zhu J J, Yang L and Zhang M 2020 Investigation of Inverse Piezoelectric Effect and Trap Effect in AlGaN/GaN HEMTs Under Reverse-Bias Step Stress at Cryogenic Temperature IEEE Access 8 35520.

[15]. Alamo J A del and Joh J 2009 GaN HEMT reliability Microelectronics Reliability s 49 1200.

[16]. Liao Z H, Guo C S, Meng J, Jiang B Y, Gao L, Su Y, Wang R M and Feng S W 2017 Thermal evaluation of GaN-based HEMTs with various layer sizes and structural parameters using finite-element thermal simulation Microelectronics Reliability 74 52.

[17]. Turin Valentin O and Balandin Alexander A 2006 Electrothermal simulation of the self-heating effects in GaN-based field-effect transistors Journal of Applied Physics 100.

[18]. Eastman L F, Tilak V, Smart J, Green B M, Chumbes E M, Dimitrov R, Kim Hyungtak and Ambacher O S 2001 Undoped AlGaN/GaN HEMTs for microwave power amplification IEEE Transactions on Electron Devices 48 479.

[19]. Bertoluzza F, Delmonte N and Menozzi R 2009 Three-dimensional finite-element thermal simulation of GaN-based HEMTs Microelectronics Reliability 49 468.

[20]. Douglas E A, Ren F and Pearton S J 2011 Finite-element simulations of the effect of device design on channel temperature for AlGaN/GaN high electron mobility transistors Journal of Vacuum Science & Technology B 29.

[21]. Liu T T, Kong Y C, Wu L S, Guo H X, Zhou J J, Kong C and Chen T S 2017 3-inch GaN-on Diamond HEMTs With Device-First Transfer Technology IEEE Electron Device Letters 38 1417.

[22]. Wang H Y, Chiu H C, Hsu W C, Liu C M, Chuang C Y, Liu J Z and Huang Y L 2020 The Impact of AlxGa1−xN Back Barrier in AlGaN/GaN High Electron Mobility Transistors (HEMTs) on Six-Inch MCZ Si Substrate Coatings 10.

[23]. Binari S C, Ikossi K, Roussos J A, Kruppa W, Park Doewon, Dietrich H B and Koleske D D 2001 Trapping effects and microwave power performance in AlGaN/GaN HEMTs IEEE Transactions on Electron Devices 48 465.

[24]. Muhaimin Haziq, Shaili Falina, Asrulnizam Abd Manaf, Hiroshi Kawarada and Mohd Syamsul 2022 Challenges and Opportunities for High-Power and High-Frequency AlGaN/GaN High-Electron-Mobility Transistor (HEMT) Applications: A Review Micromachines 13.

Cite this article

Shu,T. (2023). Reliability issues of GaN HEMT: Current status and challenges. Applied and Computational Engineering,23,238-244.

Data availability

The datasets used and/or analyzed during the current study will be available from the authors upon reasonable request.

Disclaimer/Publisher's Note

The statements, opinions and data contained in all publications are solely those of the individual author(s) and contributor(s) and not of EWA Publishing and/or the editor(s). EWA Publishing and/or the editor(s) disclaim responsibility for any injury to people or property resulting from any ideas, methods, instructions or products referred to in the content.

About volume

Volume title: Proceedings of the 2023 International Conference on Functional Materials and Civil Engineering

Conference website: https://www.conffmce.org/
ISBN:978-1-83558-067-7(Print) / 978-1-83558-068-4(Online)
Conference date: 26 August 2023
Editor:Bhupesh Kumar
Series: Applied and Computational Engineering
Volume number: Vol.23
ISSN:2755-2721(Print) / 2755-273X(Online)

© 2024 by the author(s). Licensee EWA Publishing, Oxford, UK. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license. Authors who publish this series agree to the following terms:
1. Authors retain copyright and grant the series right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this series.
2. Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the series's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial publication in this series.
3. Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See Open access policy for details).