Download pdf
Research on preparation of micron-scale orthogonally aligned HMS patterns based on soft lithography
- 1 Chengcheng Middle School
* Author to whom correspondence should be addressed.
Abstract
The soft lithography enables the fabrication of microfluidic honeycombs, which are micron-scale, orthogonally aligned hexagonal mesoporous silica (HMS) patterns with channels embedded within them, on silicon substrates. The process entails meticulous cleaning, precise master mold design (including features for channel alignment) using electron-beam lithography, generation of polydimethylsiloxane (PDMS) mold creation, ink formulation, and pattern transfer. Subsequent steps include the sol-gel transition, hardening, alignment verification, characterization, and optional functionalization. It is of the utmost importance to optimize these steps and the master design in order to achieve success. Therefore, the paper examines the creation of micron-scale HMS patterns with orthogonal alignment through the innovative application of soft lithography. The technique encompasses the strategic design of hexagonal motifs, precision master mold crafting, the PDMS stamps, and a meticulous sol-gel procedure, resulting in HMS structures that exhibit remarkable precision and adaptability. This paper underscores the transformative potential of soft lithography in the realm of advanced materials, which offers a controlled and uniform approach to size and uniformity. The refined soft lithography process not only achieves the precise orthogonal alignment of HMS patterns but also highlights its adaptability and economic viability in nanotechnology ventures.
Keywords
Soft Lithography, Hexagonal Mesoporous Silica (HMS), Polydimethylsiloxane (PDMS), Tetraethyl Orthosilicate (TEOS), Nanotechnology
[1]. Moongraksathum, B., Chen, Y.W. (2019) Synthesis and Size Control of Uniform, Spherically Shaped Hexagonal Mesoporous Silica [J]. Journal of Porous Materials, 2019, 26: 51-58.
[2]. Jundale, R.B., Sonawane, J.R., et al. (2024) Scaling-up Continuous Production of Mesoporous Silica Particles at kg Scale: Design & Operational Strategies [J]. Reaction Chemistry & Engineering, 2024.
[3]. Xu, B., Li, S, et al. (2023) Multifunctional Mesoporous Silica Nanoparticles for Biomedical Applications [J]. Signal Transduction and Targeted Therapy, 2023, 8(1): 435.
[4]. Hao, P., Peng, B., Shan, B.Q., et al. (2020) Comprehensive Understanding of the Synthesis and Formation Mechanism of Dendritic Mesoporous Silica Nanospheres. Nanoscale Advances, 2020, 2(5): 1792-1810.
[5]. Soft Lithography. (2005) https://en.wikipedia.org/wiki/Soft_lithography. (last edited on 13 February 2024)
[6]. Xia, Y.N., Whitesides, G.M. (1998) Soft Lithography. Annu. Rev. Mater. Sci. 1998. 28:153–84
[7]. Odom, T.W. et al. (2002) Improved Pattern Transfer in Soft Lithography Using Composite Stamps. Langmuir 18: 5314-5320.
[8]. Han, J., Radhakrishnan, S., Lee, C. (2013). A Novel Batch-Processing Method for Accurate Crystallographic Axis Alignment. Journal of Micromechanics and Microengineering, 23.
[9]. Lakshminarayanan, S. (2017) Micro/Nano Patterning on Polymers Using Soft Lithography Technique. Micro/Nanolithography-A Heuristic Aspect on the Enduring Technology, 2018.
[10]. Qin, D., Xia Y.N, Whitesides G.M. (2010) Soft Lithography for Micro-and Nanoscale Patterning. Nature Protocols, 2010, 5(3): 491.
[11]. Innocenzi, P. (2022) Mesoporous Ordered Films via Self-assembly: Trends and Perspectives [J]. Chemical Science, 2022, 13(45): 13264-13279.
[12]. Qin, J., Yang, Z., Xing, F., et al. (2023) Two-dimensional Mesoporous Materials for Eenergy Storage and Conversion: Current Status, Chemical Synthesis and Challenging Perspectives [J]. Electrochemical Energy Reviews, 2023, 6(1)
[13]. LaFratta, C., Li, L., Fourkas, J. (2006). Soft-lithographic Replication of 3D Microstructures with Closed Loops. Proceedings of the National Academy of Sciences of the United States of America, 103 23, 8589-94.
Cite this article
Wu,G. (2024). Research on preparation of micron-scale orthogonally aligned HMS patterns based on soft lithography. Applied and Computational Engineering,89,35-39.
Data availability
The datasets used and/or analyzed during the current study will be available from the authors upon reasonable request.
Disclaimer/Publisher's Note
The statements, opinions and data contained in all publications are solely those of the individual author(s) and contributor(s) and not of EWA Publishing and/or the editor(s). EWA Publishing and/or the editor(s) disclaim responsibility for any injury to people or property resulting from any ideas, methods, instructions or products referred to in the content.
About volume
Volume title: Proceedings of the 2nd International Conference on Functional Materials and Civil Engineering
© 2024 by the author(s). Licensee EWA Publishing, Oxford, UK. This article is an open access article distributed under the terms and
conditions of the Creative Commons Attribution (CC BY) license. Authors who
publish this series agree to the following terms:
1. Authors retain copyright and grant the series right of first publication with the work simultaneously licensed under a Creative Commons
Attribution License that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this
series.
2. Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the series's published
version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial
publication in this series.
3. Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and
during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See
Open access policy for details).